Chemi Tech Wetting and Leveling Agent Solution: Precisely Solving Coating Surface Defects

Surface defects have long been a persistent challenge for manufacturers and applicators in industrial coating processes. Issues like orange peel, cratering, and pinholes not only compromise product appearance but also reduce protective performance, leading to increased rework rates and higher costs. Traditional additives often suffer from poor compatibility, inadequate stability, or inconsistent performance.

Chemi Tech's wetting and leveling agents feature uniquely designed molecular structures that rapidly reduce system surface tension and promote uniform coating spread on substrates. These products demonstrate exceptional substrate wetting capabilities, effectively eliminating coating defects caused by substrate contamination or uneven surface tension. Additionally, they balance internal flow tension to prevent Bernard vortex formation, resulting in perfectly smooth coating surfaces.

A practical case involved a automotive components manufacturer experiencing consistent edge cratering during metal part spraying. After incorporating 0.3% Chemi Tech wetting agent, not only were cratering defects completely eliminated, but surface gloss increased by 15%. The application window significantly widened, and product yield improved from 83% to 98%.

We recommend three implementation steps: First, conduct compatibility testing to determine optimal dosage (typically 0.1%-0.5%); Second, add gradually during paint mixing with thorough dispersion; Finally, fine-tune formulation through field trials. Our technical team provides full-process support with tailored product recommendations.

Chemi Tech's laboratory equipped with advanced surface tensiometers and rheometers simulates various application conditions to deliver precise product selection guidance. Our continuous innovation has developed complete product series for water-based, solvent-borne, and UV systems, successfully solving surface treatment challenges for numerous enterprises.